Magnetically enhanced triode etching of large area silicon membranes in a molecular bromine plasma
- 1 November 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (6) , 2716-2719
- https://doi.org/10.1116/1.585989
Abstract
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