Fabrication of controlled slope attenuated phase-shift x-ray masks for 250 nm synchrotron lithography
- 1 November 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (6) , 3954-3958
- https://doi.org/10.1116/1.587409
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: