Fabrication parameters and NO2 sensitivity of reactively RF-sputtered In2O3 thin films
- 1 August 2000
- journal article
- Published by Elsevier in Sensors and Actuators B: Chemical
- Vol. 68 (1-3) , 249-253
- https://doi.org/10.1016/s0925-4005(00)00437-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
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- Methods for the preparation of NO, NO2 and H2 sensors based on tin oxide thin films, grown by means of the r.f. magnetron sputtering techniqueSensors and Actuators B: Chemical, 1992
- Correlation between Gas Sensing Properties and Preferential Orientations of Sputtered Tin Oxide FilmsJournal of the Ceramic Society of Japan, 1992