Flux Line Shear Studied in Sputtered NbN Films

1 January 1987

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 26 (S3-2) , 1529
https://doi.org/10.7567/jjaps.26s3.1529

Abstract

It is shown that above B≈0.5B_c2, the critical current density of sputtered NBN films is limited by flux line shear.The channel width for shear is determined by the lattice spacing rather than by the grain size.

Keywords

NBN
SPUTTERED
CURRENT DENSITY
SHEAR STUDIED
CHANNEL WIDTH
LINE SHEAR.THE
CRITICAL CURRENT
LATTICE SPACING
SHEAR.THE CHANNEL

This publication has 0 references indexed in Scilit: