Testing of optical materials for 193-nm applications
- 27 October 1998
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 3427, 411-419
- https://doi.org/10.1117/12.328512
Abstract
We present an assessment of bulk fused silica and calcium fluoride, and of antireflective coatings for 193-nm lithographic applications. In the course of extensive marathon studies we have accumulated 1-5 billion laser pulses on over 100 bulk material samples at fluences from 0.2 to 4 mJ/cm2/pulse. The result show large variation in both initial and induced absorption of fused silica and in densification of fused silica. For antireflective coatings, there are samples that undergo no appreciable degradation when irradiated for > 1 billion pulses at 15 mJ/cm2/pulse. However, initial losses in some coatings may be unacceptably high for lithographic applications.Keywords
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