Reactive low-voltage ion plating of hard silicon nitride optical thin films and their characterization
- 1 August 1990
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 1275, 92-101
- https://doi.org/10.1117/12.20521
Abstract
Silicon nitride films were synthesized in a Balzers BAP 800 coating plant by an plasma enhanced evaporation process. Transparent, stoichiometric films free of hydrogen, oxygen, argon, and heavy metals were obtained. The optical properties, the chemical composition, the microhardness, the structure, and the morphology of the films were investigated.Keywords
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