Direct Laser Beam Writing on YBaCuO Film for Superconducting Microelectronic Devices
- 1 August 1988
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 27 (8A) , L1517-1520
- https://doi.org/10.1143/jjap.27.l1517
Abstract
Patterning of Y-Ba-Cu-O thin films has been accomplished using a pulsed Nd:YAG laser and a specially developed software for this purpose. Various structure of different dimensions and shapes have been generated. In contrast with other researchers this process does not require any mask and complete removal of the film material has been achieved. In addition the process does not suffer from the disadvantages/problems normally associated with photolithography, wet chemical etching and plasma etching of superconducting thin films. The process has tremendous potential particularly for fabricating superconducting microelectronic devices using Y-Ba-Cu-O thin films.Keywords
This publication has 4 references indexed in Scilit:
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