Stochastic Coulomb interactions in ion projection lithography systems with aberration-broadened crossover
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2369-2372
- https://doi.org/10.1116/1.589649
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Experimental investigation of stochastic space charge effects on pattern resolution in ion projection lithography systemsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Novel electrostatic column for ion projection lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Electron-projection microfabrication systemJournal of Vacuum Science and Technology, 1975