Influence of ion energy and flux composition on the properties of plasma-deposited amorphous carbon and amorphous hydrogenated carbon films
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 246-250
- https://doi.org/10.1016/0925-9635(93)90062-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Correlation between ion-flux and microstructure of a-C:H filmsDiamond and Related Materials, 1992
- Molecular-dynamics simulation of the growth of diamondlike films by energetic carbon-atom beamsPhysical Review Letters, 1992
- Properties of diamond-like carbonSurface and Coatings Technology, 1992
- Properties of tetrahedral amorphous carbon prepared by vacuum arc depositionDiamond and Related Materials, 1991
- Diamondlike Thin Films and Their PropertiesMaterials Science Forum, 1991
- Subplantation model for film growth from hyperthermal speciesPhysical Review B, 1990