Electroless silver deposition on Si(100) substrate based on the seed layer of silver itself
- 1 July 2003
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 48 (17) , 2473-2477
- https://doi.org/10.1016/s0013-4686(03)00273-1
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Characterization of the Initial Growth Stages of Electroless Ag(W) Films Deposited on Si(100)Journal of the Electrochemical Society, 2001
- Electroless Silver Deposition in 100 nm Silicon StructuresJournal of the Electrochemical Society, 2001
- Electroless Silver and Silver with Tungsten Thin Films for Microelectronics and Microelectromechanical System ApplicationsJournal of the Electrochemical Society, 2000
- Selective and Blanket Electroless Copper Deposition for Ultralarge Scale IntegrationJournal of the Electrochemical Society, 1997
- Formation of noble-metal-Si(100) interfacesSurface Science, 1986