Properties of the TiO2 membranes prepared by CVD of titanium tetraisopropoxide
- 10 September 1998
- journal article
- Published by Elsevier
- Vol. 111 (1) , 81-92
- https://doi.org/10.1016/0376-7388(95)00278-2
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- Chemical vapor deposition of hydrogen-permselective silica films on porous glass supports from tetraethylorthosilicatePublished by Elsevier ,2001
- Characterization of hydrogen-permselective microporous ceramic membranesJournal of Membrane Science, 1994
- CVD of solid oxides in porous substrates for ceramic membrane modificationAIChE Journal, 1992
- Titania and alumina ceramic membranesJournal of Membrane Science, 1988
- PREPARATION OF POROUS, AMORPHOUS, AND ULTRAFINE TiO2 PARTICLES BY CHEMICAL VAPOR DEPOSITIONChemistry Letters, 1984
- Structural properties of titanium dioxide films deposited in an rf glow dischargeJournal of Vacuum Science & Technology A, 1983
- Chemical vapour deposition of rutile filmsJournal of Crystal Growth, 1976
- Helium Migration in TiO2‐SiO2 GlassesJournal of the American Ceramic Society, 1972
- TiO[sub 2] Film Properties as a Function of Processing TemperatureJournal of the Electrochemical Society, 1972
- Permeation of Gases through SolidsJournal of Applied Physics, 1957