Implantation of 1.5 MeV Ag+ Ions in Silica Glass
- 1 January 1990
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
Ag+ ions were implanted in silica glass at an acceleration energy of 1.5MeV. It is found that Ag atoms are present in both the metallic and ionic states. Ag atoms in the metallic state increase when the Ag atom concentration increases. It is shown that the structure of damaged glass recovers monotonically from the surface to the inside of the glass. The state of the Ag atoms does not depend on the glass structure damaged by ion implantation.Keywords
This publication has 12 references indexed in Scilit:
- Electron paramagnetic resonance spectroscopy of titanium-ion-implanted silicaJournal of Applied Physics, 1990
- Surface Structure of Ion-Implanted Silica GlassJapanese Journal of Applied Physics, 1990
- Formation of oxygen-deficient type structural defects and state of ions in SiO2 glasses implanted with transition metal ionsJournal of Non-Crystalline Solids, 1990
- Conversion electron mössbauer spectroscopic study of Fe-Implanted AgAsS2 GlassJournal of Non-Crystalline Solids, 1989
- Heavy metal fluoride glasses: modifications induced by ion implantationJournal of Non-Crystalline Solids, 1989
- Silicon Dioxide (SiO2) (Glass)Published by Elsevier ,1985
- Controlled surface crystallization of fused silica by Li+-Ion implantationRadiation Effects, 1980
- Changes in the chemical stability of ion-implanted silica glassRadiation Effects, 1976
- Near-surface nucleation and crystallization of an ion-implanted lithia-alumina-silica glassJournal of Applied Physics, 1975
- Ion-Implantation Effects in Noncrystalline SiO2IEEE Transactions on Nuclear Science, 1973