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Modeling Rapid Thermal Diffusion of Arsenic and Boron in Silicon
Home
Publications
Modeling Rapid Thermal Diffusion of Arsenic and Boron in Silicon
Modeling Rapid Thermal Diffusion of Arsenic and Boron in Silicon
RF
R. B. Fair
R. B. Fair
JW
J. J. Wortman
J. J. Wortman
JL
J. Liu
J. Liu
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1 October 1984
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 131
(10)
,
2387-2394
https://doi.org/10.1149/1.2115263
Abstract
No abstract available
Cited
Cited by 144 articles
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