Potential measurement by use of a negative‐ion source
- 1 May 1985
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 56 (5) , 1053-1054
- https://doi.org/10.1063/1.1138266
Abstract
A negative‐ion beam and the neutralized beam are used for plasma potential measurement. Advantages of this method are discussed and the method is applied to measure the plasma potential in GAMMA‐6 and GAMMA‐10 tandem mirror devices.Keywords
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