Mechanism of time-dependent oxide breakdown in thin thermally grown SiO2 films
- 1 June 1999
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 85 (11) , 7671-7681
- https://doi.org/10.1063/1.370570
Abstract
No abstract availableThis publication has 48 references indexed in Scilit:
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