Characterization of a novel microwave stripper

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Abstract
A microwave downstream reactor has been designed and constructed for use as a photoresist stripper. The reactor incorporates a cylindrical resonant cavity with a 19 mm wide quartz tube along its axis. The geometry of the cavity is designed to excite the TE112 cavity mode. An oxygen plasma is generated in the quartz tube and the afterglow of the plasma is used to strip the wafer. We have measured removal rates up to 3.5 μm/min on a 150 mm wafer. The removal rates were measured as a function of flow in the range of 0.5–5 slm, wafer temperature in the range of 75–345 °C, and power in the range of 350–700 W. Analysis of the data resulted in an activation energy of 7 kcal/mol.

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