Bucket-type ion source for ion milling

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Abstract
A bucket-type ion source for ion milling applications has been investigated. Experiments showed that uniformity of the ion beam profile is subject to the cusp field. In order to extract uniform and well-collimated ion beams, operating conditions were optimized for 500 eV argon beam extraction. Current density (0.55 mA/cm) was constant within ±5% over the center of an 8 cm diam in a 10 cm acceleration system. Uniformity of milling rate for Cr–Cu–Cr film (520 Å/min) was constant within ±6% over a 7.6 cm wafer without substrate rotation. Micrographs of the etched patterns were studied. It was concluded that a bucket-type ion source is suitable for ion milling applications, especially large-area ion milling systems.

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