Design and performance of a hot-isostatically pressed Ti/Zr segmented cathode for electromagnetically steered arc physical vapour deposition
- 24 January 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 63 (1-2) , 49-56
- https://doi.org/10.1016/s0257-8972(05)80007-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Deposition of TiN, TiC, and TiO2 films by filtered arc evaporationSurface and Coatings Technology, 1991
- Interrelationship between processing, coatingproperties and functional properties of steered arc physically vapour deposited (Ti,AI)N and (Ti,Nb)N coatingsThin Solid Films, 1990
- CrN and (Ti,AI)N coatings deposited by the steered arc and random arc techniquesSurface and Coatings Technology, 1989
- Vacuum arc investigation of dual-part cathode electrodesIEEE Transactions on Plasma Science, 1989
- Hard coatings of TiN, (TiHf)N and (TiNb)N deposited by random and steered arc evaporationSurface and Coatings Technology, 1987
- TixAl1−xN films deposited by ion plating with an arc evaporatorThin Solid Films, 1987