Soft X-ray nano lithography of semitransparent masks for the generation of high-resolution high contrast zone plates
- 1 January 1986
- proceedings article
- Published by AIP Publishing in AIP Conference Proceedings
- Vol. 147 (1) , 368-381
- https://doi.org/10.1063/1.35964
Abstract
Contamination E‐beam lithography has been used to fabricate accurate carbon zone plates to an outer zone width of 40 nm. X‐ray lithography using synchrotron radiation has been employed to generate gold zone plate replicas from semi‐transparent Carbon ZP masks which have an outer zone width of 75 nm.Keywords
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