An advanced PSA process for high speed bipolar VLSI

• 1 January 1979
• proceedings article
• Published by Institute of Electrical and Electronics Engineers (IEEE)
• https://doi.org/10.1109/iedm.1979.189618

Abstract

Keywords

• VERY LARGE SCALE INTEGRATION
• CAPACITANCE
• SILICON
• ELECTRODES
• BIPOLAR TRANSISTORS
• FABRICATION
• PROPAGATION DELAY
• BIPOLAR TRANSISTOR
• RESISTORS
• POWER DISSIPATION