Optical proximity correction by grey tone photolithography
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 153-156
- https://doi.org/10.1016/s0167-9317(00)00285-9
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- One-step 3D shaping using a gray-tone mask for optical and microelectronic applicationsMicroelectronic Engineering, 1994