Advanced deflection concept for large area, high resolution e-beam lithography

Abstract
A novel deflection system has been developed which essentially eliminates off‐axis aberrations including the transverse chromatic aberrations by employing a variable axis lens (VAL) which shifts the electron optical axis in synchronism with the deflected beam. The system comprises two precision pole piece lenses to achieve telecentricity, two composite predeflection yokes, and two yokes positioned in the pole piece region of the final lens. The field of the latter yokes satisfies the condition for shifting the electron optical axis by the distance r. This condition is 1 B (y)r (z) = 1/2 B (L) (z)r, where B (y)r denotes the deflection field of the yoke in the r direction, and B (L) the lens field on the geometrical lens axis. To successfully utilize this concept, higher order terms of the field expansions have been included in the field matching by designing yokes which satisfy first and third order conditions and dynamic focus correction coils whose field is proportional to B \\ (L) (z). The theoretical analysis of the VAL concept will be discussed together with experimental results demonstrating proper shift of the electron optical axis through elimination of transverse chromatic aberrations and coma.