Comparison of step and ramp voltage breakdown tests in aluminum oxide films
- 1 November 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 13 (1) , 221-224
- https://doi.org/10.1016/0040-6090(72)90178-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Dielectric Breakdown in Thin Evaporated Films of CaF2, MgF2, NaF, and LiFJournal of Applied Physics, 1969
- Destructive Breakdown in Thin Films of SiO, MgF2, CaF2, CeF3, CeO2 and TeflonJournal of Vacuum Science and Technology, 1969
- The Statistical Time Lag of the Dielectric Breakdown of Mica, Glass and KClJournal of the Physics Society Japan, 1954