Plasma-activated high-rate electron-beam evaporation for coating metal strips
- 15 April 1993
- journal article
- Published by Elsevier in Materials Science and Engineering: A
- Vol. 163 (2) , 149-156
- https://doi.org/10.1016/0921-5093(93)90780-i
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The development of grain structure during growth of metallic filmsActa Metallurgica, 1984
- A new sputter cleaning system for metallic substratesThin Solid Films, 1976