New trilevel and bilevel resist systems using silyl ethers of novolak and low molecular weight resist
- 1 January 1986
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 4 (1) , 409-413
- https://doi.org/10.1116/1.583344
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: