Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas
- 1 June 1993
- journal article
- plasma enhanced-chemical-vapor-deposition
- Published by Springer Nature in Applied Physics A
- Vol. 56 (6) , 527-546
- https://doi.org/10.1007/bf00331402
Abstract
No abstract availableKeywords
This publication has 68 references indexed in Scilit:
- Elongated microwave electron cyclotron resonance heating plasma sourceJournal of Vacuum Science & Technology A, 1990
- Computer simulation of materials processing plasma dischargesCritical Reviews in Solid State and Materials Sciences, 1989
- Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solidsComputer Physics Communications, 1988
- Incident angle dependence of sputtering yields for hydrogen bombardment of light elementsJournal of Nuclear Materials, 1987
- Erosion and impurity production of C and Be: A comparisonJournal of Nuclear Materials, 1987
- Energies of particles at the cathode of a glow dischargeVacuum, 1984
- Electron impact excitation of methaneThe Journal of Chemical Physics, 1983
- Carbon buildup by ion-induced polymerization under 100–400 keV H, He and Li bombardmentNuclear Instruments and Methods, 1981
- Effect of radiation damage on the erosion of graphite by atomic hydrogenJournal of Nuclear Materials, 1977
- Radiolysis of Methane in a Wide-Range Radiolysis Source of a Mass Spectrometer. I. Individual and Total Cross Sections for the Production of Positive Ions, Negative Ions, and Free Radicals by ElectronsThe Journal of Chemical Physics, 1967