Infrared Absorption of Si Oxide Films Made by Oxidation of Silane
- 1 September 1967
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 6 (9)
- https://doi.org/10.1143/jjap.6.1136
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Defects in Irradiated Silicon. II. Infrared Absorption of the Si-CenterPhysical Review B, 1961
- Infrared Absorption of Oxygen in SiliconPhysical Review B, 1957