Development of temperature-stable thick-film dielectrics. I. Low-K dielectric
- 1 January 1989
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Components, Hybrids, and Manufacturing Technology
- Vol. 12 (4) , 789-797
- https://doi.org/10.1109/33.49048
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Hybrid Microcircuitry for 300°C OperationIEEE Transactions on Parts, Hybrids, and Packaging, 1977
- Temperature-Compensated MgTi2O5-TiO2DielectricsJournal of the American Ceramic Society, 1971