Thin films-preparation, structure and properties. Thermodynamics for the chemical vapor deposition of SiCl4-TiCl4-CCl4-H2 system.
- 1 January 1987
- journal article
- Published by The Chemical Society of Japan in NIPPON KAGAKU KAISHI
- No. 11,p. 1939-1945
- https://doi.org/10.1246/nikkashi.1987.1939
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