Copper/low-k interconnects for smaller and faster circuits
- 1 September 1999
- journal article
- Published by Springer Nature in JOM
- Vol. 51 (9) , 36
- https://doi.org/10.1007/s11837-999-0157-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Copper On-Chip Interconnections: A Breakthrough in Electrodeposition to Make Better ChipsThe Electrochemical Society Interface, 1999
- Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric ApplicationsMRS Bulletin, 1997
- VLSI on-chip interconnection performance simulations and measurementsIBM Journal of Research and Development, 1995