Photoemission of Electrons from Silicon into Silicon Dioxide
- 18 October 1965
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 140 (2A) , A569-A575
- https://doi.org/10.1103/physrev.140.a569
Abstract
Electron transport in thermally grown layers of Si has been studied. Electrons are introduce into the oxide by photoemission from the adjoining silicon crystal. Specimens consist of a silicon crystal covered with an Si layer about 2 microns thick and, over this, a semitransparent gold electrode. On illuminating, light passes through the gold electrode and the oxide and is absorbed by the silicon. With appropriate voltage applied between gold and silicon, there is a steady photocurrent for light of wavelengths shorter than 2900 Å. Various possible origins of the photocurrent were investigated, and it is concluded that the current is due to photoemission of electrons from the silicon into the Si conduction band. By analysis of the spectral response of the photocurrent a photoemission threshold of 4.25 eV is obtained, independent of whether the silicon is -type or -type. This is roughly 0.9 eV smaller than the threshold for photoemission from silicon into vacuum. Using the vacuum photoemission threshold and the known optical absorption edge for Si, a diagram of the energy relations at the Si-Si interface is constructed. It is found that deep electron traps are present in concentrations around 3×/. Trapped electrons are stable against thermal ionization for hours at room temperature in the dark but may be ionized by visible light. From the spectral response for ionization of traps it is found that the trap levels lie 2 eV below the conduction-band edge. Measurements of the kinetics of trapping give a capture cross section or 1.3× , indicating that the trap is a Coulomb attractive center with a positive charge. Comparison of the magnitude of the capture cross section with a current model for capture by a Coulomb attractive center gives an estimate for the microscopic mobility of electron in the Si conduction band. The estimated value of is either 34 or 17 /Vsec depending on whether the trapping center is singly or doubly charged.
Keywords
This publication has 20 references indexed in Scilit:
- Electroplated gold and copper contacts to cadmium sulfideSurface Science, 1964
- LOW ENERGY ELECTRON DIFFRACTION STUDY OF SILICON SURFACE STRUCTURESAnnals of the New York Academy of Sciences, 1963
- The silicon insulated-gate field-effect transistorProceedings of the IEEE, 1963
- Attenuation Length Measurements of Hot Electrons in Metal FilmsPhysical Review B, 1962
- Photoemission of Holes from Tin into Gallium ArsenidePhysical Review Letters, 1962
- Mean Free Path of Photoexcited Electrons in AuPhysical Review Letters, 1962
- Photoemission in the Photovoltaic Effect in Cadmium Sulfide CrystalsJournal of Applied Physics, 1960
- Stabilization of Silicon Surfaces by Thermally Grown Oxides*Bell System Technical Journal, 1959
- Space-Charge-Limited Currents in Single Crystals of Cadmium SulfidePhysical Review B, 1955
- Intensity Measurements in the Vacuum UltravioletJournal of the Optical Society of America, 1953