A Beamline and Its Components for SR Lithography
- 1 October 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (10R) , 2080
- https://doi.org/10.1143/jjap.28.2080
Abstract
An efficient beamline for synchrotron radiation (SR) lithography has been built for the synchrotron radiation facility at NTT's Atsugi R & D Center. The relationship between the reflectivity and the surface roughness of the platinum-coated X-ray mirror, one of the key components of the beamline, is measured. The results confirm that it is necessary for the grazing angle of the mirror to be smaller than 2°. A beamline consisting of two X-ray mirror optics and two X-ray windows is proposed for exposure in an atmospheric environment. The optimum mirror optics for converging and collimating the X-ray beam are investigated using a ray-tracing technique, and their feasibility is experimentally confirmed.Keywords
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