Relief and Functional Photoimaging with Chemically Amplified Resists Based on Di-tert-Butyl Butenedioate-co-Styrene
- 1 May 1995
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 7 (5) , 850-855
- https://doi.org/10.1021/cm00053a006
Abstract
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