Prospects for printing very large scale integrated circuits with masked ion beam lithography

1 May 1986

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology A

Vol. 4 (3) , 777-783
https://doi.org/10.1116/1.573812

Abstract

Ions hold a number of advantages over UV photons, x-ray photons, and electrons when used for high resolution printing. Masked ion beam lithography (MIBL) has demonstrated many of the requirements of a very large scale integrated (VLSI) lithographic tool. Some of the different approaches to MIBL and their advantages will be discussed.

Keywords

MAGNETIC FIELD
ION BEAM
HIGH RESOLUTION
ELEMENTARY PARTICLES
ELECTROMAGNETIC RADIATION

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