High density plasma etching of III–V nitrides

• 1 May 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 14  (3) , 1011-1014
• https://doi.org/10.1116/1.580123

Abstract

Keywords

• IODINE
• SPUTTERING
• MATERIALS SCIENCE
• BROMINE
• CHLORINE
• ETCHING