Evidence for hole and electron trapping in plasma deposited ZrO2 thin films
- 15 October 2001
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 90 (8) , 4284-4286
- https://doi.org/10.1063/1.1401796
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Infrared properties of room-temperature-deposited ZrO2Applied Physics Letters, 2001
- Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor depositionApplied Physics Letters, 2001
- Trap-assisted tunneling in high permittivity gate dielectric stacksJournal of Applied Physics, 2000