PREPARATION OF ATOMICALLY CLEAN SURFACES OF Si AND Ge BY HEATING IN VACUUM
- 15 May 1965
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 6 (10) , 205-206
- https://doi.org/10.1063/1.1754133
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Room Temperature Chemical Polishing of Ge and GaAsJournal of the Electrochemical Society, 1964
- Structures of Clean Surfaces of Germanium and Silicon. IJournal of Applied Physics, 1963
- Low-Energy Electron Diffraction Study of Silicon Surface StructuresThe Journal of Chemical Physics, 1962
- Cleaning of Silicon Surfaces by Heating in High VacuumJournal of Applied Physics, 1959
- Variation of contact potential with crystal face for germaniumJournal of Physics and Chemistry of Solids, 1957
- The Adsorption of Gases on a Germanium SurfaceThe Journal of Physical Chemistry, 1955
- Ion Bombardment-Cleaning of Germanium and Titanium as Determined by Low-Energy Electron DiffractionJournal of Applied Physics, 1955