0.3 μm contact layer: process characterisation
- 31 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1) , 89-92
- https://doi.org/10.1016/s0167-9317(99)00022-2
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- 1X deep-UV lithography with chemical amplification for 1-micron DRAM productionPublished by SPIE-Intl Soc Optical Eng ,1990