Submicron electrically conducting wires produced in polyimide by ultraviolet laser irradiation
- 17 May 1993
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (20) , 2572-2574
- https://doi.org/10.1063/1.109300
Abstract
An array of permanently electrically conducting lines with a width of 0.5 μm and a period of 0.9 μm has been produced in polyimide with a KrF laser using a holographic technique. The electrical resistivity of these submicron structures shows an ohmic characteristic and has a value of less than 0.5 Ω cm, while the resistivity perpendicular to the structures exceeds this value by more than a factor of 107. The temperature dependence of the conductivity in these wires is found to be similar to that found for macroscopic regions of polyimide which show laser induced conductivity.Keywords
This publication has 8 references indexed in Scilit:
- Ultraviolet-laser-induced permanent electrical conductivity in polyimideApplied Physics A, 1993
- Direct laser ablation of sub-100 nm line structures into polyimideApplied Physics A, 1992
- Excimer Laser Induced Electrical Conductivity in PolymersMRS Proceedings, 1992
- Sub-100 nm lines produced by direct laser ablation in polyimideApplied Physics Letters, 1991
- Permanent increase of the electrical conductivity of polymers induced by ultraviolet laser radiationApplied Physics Letters, 1991
- Carbonization of polyimide film “Kapton”Carbon, 1989
- Direct production of gratings on plastic substrates using 248-nm KrF laser radiationApplied Optics, 1987
- Excimer laser etching of polyimideJournal of Applied Physics, 1985