Argon and reactive ion beam etching for SAW devices
- 1 March 1984
- Vol. 34 (3-4) , 417-424
- https://doi.org/10.1016/0042-207x(84)90077-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Plasma polymerization of fluorocarbons in rf capacitively coupled diode systemJournal of Vacuum Science and Technology, 1981
- The Use of Surface-Elastic-Wave Reflection Gratings in Large Time-Bandwidth Pulse-Compression FiltersIEEE Transactions on Microwave Theory and Techniques, 1973