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A positive tone plasma-developable resist obtained by gas-phase image reversal
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A positive tone plasma-developable resist obtained by gas-phase image reversal
A positive tone plasma-developable resist obtained by gas-phase image reversal
SM
Scott A. MacDonald
Scott A. MacDonald
HS
Hubert Schlosser
Hubert Schlosser
NC
Nicholas J. Clecak
Nicholas J. Clecak
CW
C. Grant Willson
C. Grant Willson
Jean M. J. Frechet
Jean M. J. Frechet
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1 November 1992
journal article
Published by
American Chemical Society (ACS)
in
Chemistry of Materials
Vol. 4
(6)
,
1364-1368
https://doi.org/10.1021/cm00024a043
Abstract
No abstract available
Cited
Cited by 6 articles
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