Application of a Semi‐insulating Amorphous Hydrogenated Silicon Nitride Film as a Resistive Field Shield and Its Reliability
- 1 December 1998
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 145 (12) , 4296-4304
- https://doi.org/10.1149/1.1838954
Abstract
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