Photo CVD system for silicon nitride film
- 1 January 1986
- journal article
- research article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 15 (1) , 27-30
- https://doi.org/10.1007/bf02649946
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Photo-Chemical Vapor Deposition of Silicon Nitride Film by Direct PhotolysisJapanese Journal of Applied Physics, 1983
- Degradation-Free P-CVD SiN Deposition on GaAs FETsJapanese Journal of Applied Physics, 1983
- A MESFET model for circuit analysisSolid-State Electronics, 1980
- Source of radiation damage to MOS devices during S-GunR metallizationJournal of Vacuum Science and Technology, 1980
- RADIATION DAMAGE IN RADIO-FREQUENCY-SPUTTERED SiO2 FILMSApplied Physics Letters, 1969