Dielectric properties of fluorocarbon and chlorofluorocarbon films plasma polymerized in an R.F. glow discharge
- 1 February 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 136 (1) , 11-19
- https://doi.org/10.1016/0040-6090(86)90103-3
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Electrical properties of plasma-polymerized thin organic filmsPlasma Chemistry and Plasma Processing, 1983
- The properties of films prepared by the rf sputtering of PTFE and plasma polymerization of some freonsVacuum, 1981
- A Review of Recent Advances in Plasma PolymerizationPublished by American Chemical Society (ACS) ,1979
- Conduction mechanism in plasma-polymerized tetrafluoroethylene filmsJournal of Applied Physics, 1978
- The properties of fluorocarbon films prepared by r.f. sputtering and plasma polymerization in inert and active gasThin Solid Films, 1977
- Dielectric Relaxations in Plasma-Polymerized Hydrocarbons and FluorocarbonsJournal of Macromolecular Science: Part A - Chemistry, 1976
- Thin Polymer Films by the Glow-Discharge Indirect MethodJournal of Macromolecular Science: Part A - Chemistry, 1976
- Evaporation of polytetrafluoroethylene by electron bombardment of the bulk materialThin Solid Films, 1974
- Dielectric properties of polystyrene formed in a glow dischargeJournal of Polymer Science: Polymer Physics Edition, 1974
- Some characteristics of sputtered polytetrafluoroethylene filmsThin Solid Films, 1972