Controlled-ambient photolithography of polysilane resists at 193 nm

• 1 November 1989
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 7  (6) , 1629-1633
• https://doi.org/10.1116/1.584504

Abstract

Keywords

• POLYSILANE RESISTS
• CONTROLLED AMBIENT PHOTOLITHOGRAPHY