Fast-discharge-initiated XeF laser
- 15 March 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (6) , 326-328
- https://doi.org/10.1063/1.88745
Abstract
By means of fast‐discharge circuitry, intense laser emission was observed from the XeF molecule at 351, 353, and 349 nm in a gas mixture of He, Xe, and NF3. The over‐all electrical efficiency based on the energy deposited in the gas was 1.2%; the ’’wall‐plug’’ efficiency was 0.2%. An output energy of 1 mJ was measured from a laser pulse 40 nsec in duration, yielding a peak power of 25 kW. A simple model is proposed to estimate the laser performance.Keywords
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