Multilayer Reflection Filters For Soft X-Rays

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Abstract
Multilayer reflection filters were designed for use in photo-CVD experiments with soft X-rays of ≈100 eV. Mo/Si (27 layers) and Rh/Si (21 layers) filters were fabricated on superpolished CVD-SiC substrates by means of ion-beam sputtering. Their spectral reflectances were measured at 10°-55° angles of incidence over a photon energy range of 65-115 eV. A peak reflectance of 43% and a FWIIM of ≈8 eV were found at ≈49° angle of incidence for soft X-rays of ≈100 eV. The filters were then used as a dispersive element in photo-CVD experiments at the Photon Factory. It was found that the filters could withstand strong undispersed synchrotron radiation for many hours, retaining a reflectance of ≈28%, and that they were able to deliver a narrow-band photon flux of ≈1015 photons/s at ≈100 eV into the photo-reaction chamber.

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