A plasma-polymerized protective film for transmission electron microscopy specimen preparation by focused ion beam etching
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3) , 1127-1130
- https://doi.org/10.1116/1.581245
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Formation of silicon-on-insulator layers by electron beam recrystallizationMicroelectronic Engineering, 1988