Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications
- 1 September 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 12 (5) , 2754-2761
- https://doi.org/10.1116/1.579100
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: