Activation analytical investigation of contamination and cross-contamination in ion implantation
- 1 July 1978
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 7 (4) , 525-533
- https://doi.org/10.1007/bf02655416
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Interfacial edge dislocations and dislocation walls in anisotropic two−phase mediaJournal of Applied Physics, 1975
- Implantation of Argon into SiO[sub 2] Films Due to Backsputter CleaningJournal of the Electrochemical Society, 1974
- Fehlerquellen bei Aktivierungsanalysen hochreiner MaterialienAnalytical and Bioanalytical Chemistry, 1973
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969